Tel-Aviv University’s NanoCenter is a facility for micro and nano fabrication and characterization.

The Tel Aviv University Center for Nanoscience and Nanotechnology is a multidisciplinary research center, committed to advancing society by conducting cutting edge research and developing state of the art technologies, by engaging in close cooperation with TAU research community, industry and society. Established already in 2000, we pioneered Nanotechnology in Israel and since then we are a leading Nanocenter in Israel.

Two disciplinary centers combine to form the center:
1. The Chaoul Center for Nanoscale system
2. The Wolfson Applied Materials Research Centre

Chaoul Center offers services of nanoscale development, fabrication and characterization – the foundation for all experimental work at the nanoscale. Its cutting-edge equipment and professional support enable researchers to manufacture full-process prototypes of their miniscule inventions, and then test their various properties – electrical, optical, mechanical, chemical and/or biological, consequently optimizing these characteristics for important uses and applications. We also promote hands-on use of our devices and facility by both TAU researchers and external customers, providing them with professional guidance and training for work with the various devices.

Wolfson Centre main goal is to make its analytical capabilities available to all the research groups in Tel-Aviv university, in all other universities, and to Israeli industry, both by providing professional services and by undertaking joint projects.

The Centre’s features include state-of-the-art analytical tools, comprehensive characterization systems under one roof, highly professional staff members backed by eminent professors in diverse areas of materials science, and a central, accessible location.

Center Manager: Alice Polacsi-Segev

Advanced equipment:
• Assisting users in: MEMS, NEMS, Bio-chips, Electro-optics, and more
• Dual beam FIB – highly advanced technology
• Laser micromachining – the first in Israel and one of the few systems in the world
• Lithography mask design and fabrication
• E-beam and optical lithography, various thin film deposition methods, wet and dry etching, backend processing, and various characterization methods available
• Probe station
• NIL (nano imprint lithography) 
• Users can work independently, with assistance, or through our staff. 
• Brainstorming with the customer and a team of experts can help you develop your project from scratch 
We will be happy to provide more information.
Our Mission:
• Enable advanced R&D capability and state-of-the-art technologies of both fabrication and characterization.
• Promote multidisciplinary research activities and expand research infrastructure resources on campus.
• Manage core central equipment facilities.
• Support the recruitment of outstanding researchers.
• Promote international collaborations with leading Universities around the world.
• Launch educational programs for young researchers and for the public.
• Collaborate with the Israeli industry and contribute to the country’s technology evolution.
List of Equipment:
Photolithography Mask Fabrication-
• Direct laser writing & photomask preparation (Heidelberg Instruments Fast Scan DWL-66fs)
Photolithography and nanoimprint lithography
• Contact lithography (Suss MA6, MJB3)
• E-beam lithography (Raith 150, Raith150 II)
• I-beam Lithography (FIB Raith-iou line, Heli)
• Nanoimprint Lithography (S.E.T. FC-150)
Deposition- 
• E-gun evaporation (VST, VST GB, Edwards 306)
• Magnetron Sputtering RF&DC (Vinci)
• Magnetron Sputtering RF and DC (Penta Vacuum)
• RF Diode sputtering (MRC)
• PECVD (Oerlikon)
• E-gun Evaporator (Vinci)
• Thermal and Plasma ALD (Beneq)
• Electroplating Yamamoto

Thermal treatment-
• RTP (Jipelec Jetfirst 100)
• Ovens
Etch-
• Ion Beam Milling AJA
• Wet and dry substrate cleaning
• RIE etching (Nextral 860 HDP RIE, Oerlikon 790 RIE)
DRIE etching (PlasmaTherm 770 ICP DRIE, Versaline DSE)
• Wet and dry substrate cleaning
Micro-Machining-
• Femtosecond Laser ELAS
Backend-
• Dicing (Disco DAD 3350)
• Wire & ball Bonding (K&S)
• Precision Diamond Scriber (ATV)
Electron microscopes-
• Environmental Scanning Electron Microscope (ESEM – FEI Quanta 200 FEG)
• Helius 5 Dual Column FIB-HRSEM FIB (ThermoFisher)
• Focused Ion Beam  (Raith ionLine)
• Transmission Electron Microscope (TEM) (JEOL)

AFM/STM-
• AFM (Molecular Imaging PicoSPM II) 
• Variable Temperature Ultra-High Vacuum STM/AFM System
(Omicron) 
• JPK Biological AFM coupled with Raman Spectroscopy

Optical microscopy-
• Metallurgical confocal microscope (Olympus LEXT)
• Measurement microscope (Hisomet II)
• Inspection Microscopes (Olympus MX-40, MX-50)
• UV-VIS-NIR Spectrometer Cary500i
• FTIR spectrometer Bruker
• ThermalFisher – Nickolet FTIR

Measurements-
• Stylus profilometers Profile/Step height (Tencor, Veeco)
• Spectroscopic Ellipsometer (Woollam M2000DUV)
• Spectroscopic Reflectometer (Sentech FTP)
• Film Stress and 3D surface profiling (KLA P16+)
• DLS (Malvern)

Electrical characterization
• 4 Point Probe (JANDEL Model RM3000+)
• Keithley Semiconductor Parameter Analyzer 4200 
• Keithley Impedance Analyzer 
• EVERBEING Probe Station

Characterization-
• Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) (TRIFT97)
• Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS) (PHI 5600)
• X-ray Diffraction (XRD) (Bruker)
• Differential Scanning Calorimetry (DSC)
• Thermal Gravimetric Analysis (TGA)
• Thermal Gravimetric Analysis (TGA)

Contact:

Alice Polacsi-Segev
Managing Director
Email: alicepolacsi@tauex.tau.ac.il
Phone: 03-6405619

Valery Garber
Chief Fabrication Engineer
Email: valeryg@tauex.tau.ac.il
Phone: 03-640513

The facilities are located:

• Engineering facility
• Nano center facility: https://nano.tau.ac.il/
• Multi-disciplinary Building